Press Releases

The Global Extreme Ultraviolet (EUV) Lithography Market is anticipated to grow from USD 9.6 billion in 2023 to USD 26.2 billion in 2030 at a CAGR of 22.4% during the forecast period from 2025 to 2030.

Extreme ultraviolet lithography is a technology used in the semiconductor industry for manufacturing integrated circuits. Extreme ultraviolet (EUV) light is used to create intricate patterns on silicon wafers with this type of photolithography. EUV is a very efficient process as it helps to cut down the production cost by allowing the companies to make more advanced products. Its high-resolution is the other major advantage of EUV lithography as its improved line geometry can reduce the chip size by five to ten times. EUV technology is pushing the boundaries for the next technological breakthrough like future trends such as 5G, artificial intelligence and autonomous driving. Technology providers and manufacturers are collaborating to develop next-generation EUV lithography systems in the market. Continuous investment in research and development and reduction in the cost of manufacturing components are increasing the demand for EUV lithographhe growing ic systems. However, The main restraints of the Global Extreme Ultraviolet (EUV) Lithography Market are the high cost required to implement EUV lithography and the limited supply of EUV light source.

Browse 46 market data Tables and 30 Figures spread through 194 Pages and in-depth TOC on Global Extreme Ultraviolet (EUV) Lithography Market By Equipment (Light Sources, Masks and Optics), By End User (Integrated Device Manufacturer (IDM) and Foundry) and By Geography (Europe, Americas and Asia Pacific) - Global Forecast from 2025 to 2030.

Global Extreme Ultraviolet (EUV) Lithography Market Segmentation and Key Players

By equipment, the light source dominate the global extreme ultravilet lithography market.

EUV light source dominates the market as it is a crucial component used in the semiconductor industry’s EUV lithography systems.

"The Asia Pacific is projected to register the fastest CAGR during the forecast period, i.e., 2025-2030 in the global extreme ultravilet lithography market.”

The Asia Pacific region dominated the market growth and is further projected to maintain its dominance during the forecasted period as the countries, Japan, Taiwan, China, South Korea and the rest of Asia Pacific have made substantial investments in the development and implementation of EUV lithography technology. The growing need for faster smaller and more energy-efficient semiconductors is boosting the adoption of advanced lithography technologies like EUV.

Some of the key players in this market are Leonardo SpA (Italy), Lockheed Martin Corporation (U.S.), Northrop Grumman Corporation (U.S.), Raytheon Technologies Corporation (U.S.), SAAB AB (Sweden), and others.

The global extreme ultravilet lithography market report offers a comprehensive market segmentation analysis along with estimation for the forecast period 2025–2030.

Global Extreme Ultravilet (EUV) Lithography Market coverage (By Value)

• Equipment Insight and Forecast 2025 - 2030
  • Light Sources
  • Masks
  • Optics
• End User Insight and Forecast 2025 - 2030
  • Integrated Device Manufacturer (IDM)
  • Foundry

Geographical Segmentation

Global Extreme Ultravilet (EUV) Lithography Market by Region

• Europe
  • Germany
  • U.K.
  • France
  • Italy
  • Spain
  • Russia
  • Rest of Europe
• Americas
  • U.S.
  • Canada
  • Mexico 
• Asia-Pacific (APAC)
  • China
  • Japan
  • South Korea
  • India
  • Australia
  • Rest of APAC