Industry Overview
The Global Extreme Ultraviolet (EUV) Lithography Market is anticipated to grow from USD 9.6 billion in 2023 to USD 26.2 billion in 2030 at a CAGR of 22.4% during the forecast period from 2025 to 2030.
Mikrochips are the structures which shows 5,000 times finer than a human hair and are produced with light of the extremely short wavelength. For this purpose, EUV lithography optics are used in production. EUV technology is pushing the boundaries for the next technological breakthrough like future trends such as artificial intelligence, 5G and autonomous driving. EUV Lithography is a cutting-edge technique for fabricating semiconductors which uses short light wavelengths to print complex patterns on integrated circuits. As a result of the increasing demand for micro technologies like integrated circuits (IC), other semiconductors and microprocessors, extreme ultraviolet lithography systems are becoming increasingly popular around the globe. EUV lithography market is concentrating on a data-centric strategy, to increase the range of technological solutions that meet objectives of the client.
Market Segmentation
Insight by Equipment
On the basis of equipment, the Global Extreme Ultraviolet (EUV) Lithography Market is segregated into Light Sources, Masks and Optics. EUV light source dominates the market as it is a crucial component used in the semiconductor industry’s EUV lithography systems.
Insight by End User
- Integrated Device Manufacturer (IDM)
- Foundry
According to the end-user, the Global Extreme Ultraviolet (EUV) Lithography Market is segregated into Integrated Device Manufacturer (IDM) and Foundry. The integrated device manufacturers (IDM) segment is projected to be the fastest-growing segments in the EUV lithography market. New leading-edge nodes with increased lithography intensity and rising wafer capacity are estimated to further drive the lithography demand for the IDM segment.
Global Extreme Ultraviolet (EUV) Lithography Market Report Coverage
Report Metric
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Details
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Historical Period
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2018 - 2023
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Base Year Considered
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2024
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Forecast Period
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2025 - 2030
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Market Size in 2023
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U.S.D. 9.6 Billion
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Revenue Forecast in 2030
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U.S.D. 26.2 Billion
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Growth Rate
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22.4%
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Segments Covered in the Report
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By Equipment, By End User
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Report Scope
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Market Trends, Drivers, and Restraints; Revenue Estimation and Forecast; Segmentation Analysis; Impact of COVID-19; Companies’ Strategic Developments; Market Share Analysis of Key Players; Company Profiling
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Regions Covered in the Report
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Europe, Americas and Asia Pacific
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Industry Dynamics
Growth Driver
The growth drivers of Extreme Ultraviolet Lithography is the growing technological advancements for high-volume manufacturing of microchips that are significantly used in several applications. Investment in technology providers and research & development to enhance EUV technology is the key factor boosting the demand for EUV lithographic systems. Technology providers and manufacturers are collaborating to develop next-generation EUV lithography systems in the market. Continuous investment in research and development and reduction in the cost of manufacturing components are increasing the demand for EUV lithographhe growing ic systems. Increasing automation in the automotive industry is too a significant factor accelerating the demand for EUV lithographic systems in the market. The growth in the electric vehicle segment shall contribute to t as they contain semiconductors, in developed as well as developing countries across the globe will also contribute to the growing sales of EUV lithographic systems. Growing investments in research & development to create a new range of integrated circuits (IC), power devices, semiconductors, and others are differentiating factors increasing the overall demand for EUV lithographic systems. This market is dominated by few manufacturers which gives them a monopoly over the market as EUV lithography systems are very much complicated that require over many components to build one unit. Hence, the manufacturers focus on developing new solutions to cater to the market needs. The market is boosting the demand for EUV lithographic systems in the global market due to the increasing demand for micro technologies such as integrated chips (IC), microprocessors and other semiconductors.
Restraints
The main restraint of the Global Extreme Ultraviolet (EUV) Lithography Market is the high cost required to implement EUV lithography. Another constraint of this market is the limited supply of EUV light source as generating stable and reliable EUV light at the required power levels is complex and requires advanced technologies.
Geographic Overview
Geographically, the Global Extreme Ultraviolet (EUV) Lithography Market is segregated into Europe, Americas and Asia Pacific. Among these, The Asia Pacific region dominated the market growth and is further projected to maintain its dominance during the forecasted period as the countries, Japan, Taiwan, China, South Korea and the rest of Asia Pacific have made substantial investments in the development and implementation of EUV lithography technology. The growing need for faster smaller and more energy-efficient semiconductors is boosting the adoption of advanced lithography technologies like EUV.
Competitive Insights
The major players are actively investing in new product launches, research and development, partnerships, expansions and acquisitions.
Canon Inc. is a Japanese multinational corporation that specializes in imaging, optical and industrial products, such as cameras, lenses, scanners, printers, medical equipment and semiconductor manufacturing equipment.
ASML Holding N.V. is a company that makes and sells advanced semiconductor equipment systems. ASML provides lithography systems which are needed to produce microchips.
Key Players Covered in the Report
Some of the key players in this market are Canon, ASML, Hoya Corporation, KLA Corporation, Carl Zeiss AG, Nikon, Intel, Samsung, SK Hynix, Toshiba, Toppan Printing, NTT Advanced Technology, TSMC, Global Foundries
Recent developments by Key Players
Intel's chip foundry business has successfully assembled the most advanced piece of semiconductor kit which is a High Numerical Aperture Extreme Ultraviolet lithography scanner. The new High-NA machines use extreme ultraviolet light to fire a laser at a droplet of tin heated to almost 220,000 degrees Celsius. The reflected light creates a circuit pattern, which is used etch circuits onto the silicon.
Canon has announced the new flagship image PROGRAF PRO-1100 A2 desktop photo printer that is designed to give the highest print quality of any Canon desktop printer along with enhanced durability.
The Global Extreme Ultraviolet (EUV) Lithography Market report offers a comprehensive market segmentation analysis along with estimation for the forecast period 2025–2030.
Segments Covered in the Report
Region Covered in the Report
- Europe
- Germany
- U.K.
- France
- Italy
- Spain
- Russia
- Rest of Europe
- Americas
- Asia-Pacific (APAC)
- China
- Japan
- South Korea
- India
- Australia
- Rest of APAC
Source: VynZ Research